Updated Thu 29 July 2010
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Silicon Wafers - EPI Wafers

4" EPI Wafers, 3" EPI Wafers

4" EPI Wafers
Note: Surface - P = Polished, E = Etched, C = AsCut, Ox = Oxide (on that layer)
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Cart		 Item Qty in Stock Price $/Qty Substrate EPI Source Comment
Size Type Res Ωcm Surf. Thick μm Type Res Ωcm

B195 4 40.00 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 4.5± n- Si:P (4.95-6.05) ITME due 8/12 N/N+

AF95 25 102.80 4"Øx525μm n- Si:As[111-4°] ±0.5° 0.001-0.004 P/E 31±2.2 n- Si:P (9.3-10.7) aro 5-7 wks N/N+

B274 3 42.40 4"Øx400μm n- Si:Sb[111] 0.005-0.020 P/E 20 n- Si:P 700 ±10% ITME N/N+

D274 6 38.80 4"Øx360μm n- Si:Sb[111] 0.005-0.020 P/E 20 n- Si:P 400 ±10% ITME N/N+

8174 23 40.00 4"Øx525μm n- Si:Sb[111] 0.008-0.020   70±5 n- Si:P 60±5 ITME N/N+

E4_104 6 52.80 4"Øx380μm p- Si:B[111] 0.008-0.020 P/EOx 10.5 p- Si:B 570 ±10% ITME aro 2 wks P/P+

E4_22 3 64.00 4"Øx440μm p- Si:B[111] 0.008-0.020 P/E 20 p- Si:B 0.15 ±10% ITME aro 2 wks P/P+

E4_49 3 63.60 4"Øx440μm p- Si:B[111] 0.008-0.020 P/E 20 p- Si:B 225 ±10% ITME aro 2 wks P/P+

E4_106 9 47.20 4"Øx440μm p- Si:B[111] 0.008-0.020 P/E 20 p- Si:B 0.25±10% ITME aro 2 wks P/P+

E4_105 7 50.40 4"Øx525μm p- Si:B[111] 0.001-0.005 P/E 20 p- Si:B 175±10% ITME aro 2 wks P/P+

E4_109 4 61.20 4"Øx525μm p- Si:B[111] 0.008-0.020 P/E 20 p- Si:B 7.5±10% ITME aro 2 wks P/P+

E4_26 12 40.80 4"Øx440μm p- Si:B[111] 0.008-0.020 P/E 21 p- Si:B 150 ±10% ITME aro 2 wks P/P+

E4_103 3 69.60 4"Øx380μm p- Si:B[111] 0.008-0.020 P/EOx 22.5 p- Si:B 115±10% ITME aro 2 wks P/P+

E4_107 8 48.80 4"Øx380μm p- Si:B[111] 0.008-0.020 P/EOx 23 p- Si:B 200±10% ITME aro 2 wks P/P+

E4_108 9 47.20 4"Øx380μm p- Si:B[111] 0.008-0.020 P/EOx 23 p- Si:B 80±10% ITME aro 2 wks P/P+

E4_38 7 56.00 4"Øx525μm p- Si:B[111] 0.008-0.020 P/E 27.5 p- Si:B >250 ITME aro 2 wks P/P+

E4_102 9 49.60 4"Øx440μm p- Si:B[111] 0.008-0.020 P/E 32 p- Si:B 700±10% ITME aro 2 wks P/P+

E4_42 7 50.40 4"Øx440μm p- Si:B[111] 0.008-0.020 P/E 32 p- Si:B 600 ±10% ITME aro 2 wks P/P+

E4_50 9 47.20 4"Øx440μm p- Si:B[111] 0.008-0.020 P/E 33 p- Si:B 630 ±10% ITME aro 2 wks P/P+

E4_4 10 53.20 4"Øx450μm p- Si:B[111] 0.008-0.020 P/E 35 p- Si:B 1,000 ±10% ITME aro 2 wks P/P+

E4_21 5 63.20 4"Øx380μm p- Si:B[111] 0.008-0.020 P/EOx 40 p- Si:B 550 ±10% ITME aro 2 wks P/P+

E4_23 5 59.60 4"Øx525μm p- Si:B[111] 0.004-0.008 P/E 85 n- Si:P 15.2-16.2 ITME aro 2 wks N/P+

E4_33 2 98.00 4"Øx525μm p- Si:B[111] 0.008-0.020 P/E 100 n- Si:P 45 ±10% ITME aro 2 wks N/P+

E4_31 8 60.80 4"Øx525μm p- Si:B[111] 0.008-0.020 P/E 105 n- Si:P 32 ±10% ITME aro 2 wks N/P+

E4_18 9 40.00 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 4.5 n- Si:P 5.5 ±10% ITME aro 2 wks N/N+

E4_83 17 44.40 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 6.5 n- Si:P >50 ITME aro 2 wks N/N+

E4_84 9 47.20 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 16.5 n- Si:P 35 ±10% ITME aro 2 wks N/N+

E4_68 9 53.80 4"Øx380μm n- Si:As[111] 0.001-0.005 P/EOx 20 n- Si:P 270 ±10% ITME aro 2 wks N/N+

E4_91 9 47.20 4"Øx400μm n- Si:As[111] 0.001-0.005 P/E 20 n- Si:P 0.13 ±10% ITME aro 2 wks N/N+

E4_92 11 45.20 4"Øx400μm n- Si:As[111] 0.001-0.005 P/E 20 n- Si:P 0.15 ±10% ITME aro 2 wks N/N+

E4_30 7 48.00 4"Øx525μm n- Si:As[111] 0.001-0.005 P/E 20 n- Si:P 65 ±10% ITME aro 2 wks N/N+

E4_93 7 50.40 4"Øx400μm n- Si:As[111] 0.001-0.005 P/E 20 n- Si:P 0.19 ±10% ITME aro 2 wks N/N+

E4_88 4 61.20 4"Øx400μm n- Si:As[111] 0.001-0.005 P/E 20 n- Si:P 0.23 ±10% ITME aro 2 wks N/N+

E4_90 8 48.80 4"Øx400μm n- Si:As[111] 0.001-0.005 P/E 20 n- Si:P 0.09 ±10% ITME aro 2 wks N/N+

E4_74 9 49.60 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 20 n- Si:P >1100 ±10% ITME aro 2 wks N/N+

E4_75 20 43.60 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 20 n- Si:P >500 ±10% ITME aro 2 wks N/N+

E4_89 9 47.20 4"Øx400μm n- Si:As[111] 0.001-0.005 P/E 20 n- Si:P 0.07 ±10% ITME aro 2 wks N/N+

E4_10 25 43.60 4"Øx400μm n- Si:As[111] 0.001-0.005 P/E 20 n- Si:P 90 ±10% ITME aro 2 wks N/N+

E4_69 9 46.00 4"Øx380μm n- Si:As[111] 0.001-0.005 P/EOx 21 n- Si:P 150 ±10% ITME aro 2 wks N/N+

E4_54 9 47.20 4"Øx525μm n- Si:As[111] 0.001-0.005 P/E 27 n- Si:P 220 ±10% ITME aro 2 wks N/N+

E4_36 9 55.60 4"Øx525μm n- Si:As[111] 0.001-0.005 P/E 27.5 n- Si:P 1300 ±10% ITME aro 2 wks N/N+

E4_52 15 42.80 4"Øx525μm n- Si:As[111] 0.001-0.005 P/E 27.5 n- Si:P >250 ITME aro 2 wks N/N+

E4_53 9 47.20 4"Øx525μm n- Si:As[111] 0.001-0.005 P/E 28 n- Si:P 165 ±10% ITME aro 2 wks N/N+

E4_78 13 50.00 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 40 n- Si:P 650 ±10% ITME aro 2 wks N/N+

E4_87 8 57.20 4"Øx380μm n- Si:As[100] 0.004-0.008 P/EOx 40 n- Si:P >1000 ITME aro 2 wks N/N+

E4_86 8 54.80 4"Øx380μm n- Si:As[100] 0.004-0.008 P/EOx 40 n- Si:P >500 ITME aro 2 wks N/N+

E4_35 12 54.00 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 40.5 n- Si:P 5500 ±10% ITME aro 2 wks N/N+

E4_6 15 51.20 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 41 n- Si:P 1300 ±10% ITME aro 2 wks N/N+

E4_77 18 47.60 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 41.5 n- Si:P >200 ITME aro 2 wks N/N+

E4_81 20 53.20 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 41.5 n- Si:P >300 ±10% ITME aro 2 wks N/N+

E4_76 16 48.40 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 41.5 n- Si:P 430 ±10% ITME aro 2 wks N/N+

E4_82 9 55.60 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 41.5 n- Si:P >1000 ITME aro 2 wks N/N+

E4_3 8 57.20 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 42 n- Si:P 2,000 ±10% ITME aro 2 wks N/N+

E4_80 8 54.80 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 42.5 n- Si:P 400 ±10% ITME aro 2 wks N/N+

E4_16 7 56.40 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 43 n- Si:P 340 ±10% ITME aro 2 wks N/N+

E4_79 8 54.80 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 43 n- Si:P >200 ITME aro 2 wks N/N+

E4_17 8 54.80 4"Øx380μm n- Si:As[111] 0.004-0.008 P/EOx 43 n- Si:P 600 ±10% ITME aro 2 wks N/N+

E4_85 14 51.60 4"Øx380μm n- Si:As[111] 0.004-0.008 P/E 65 n- Si:P >600 ITME aro 2 wks N/N+

E4_15 2 88.40 4"Øx525μm n- Si:As[111] 0.001-0.005 P/E 67.5 n- Si:P 16 ±10% ITME aro 2 wks N/N+

E4_24 10 48.40 4"Øx525μm n- Si:As[111] 0.001-0.005 P/E 75 n- Si:P 66 ±10% ITME aro 2 wks N/N+

E4_5 15 45.20 4"Øx525μm n- Si:As[111] 0.001-0.005 P/EOx 78 n- Si:P 20 ±10% ITME aro 2 wks N/N+

E4_59 9 49.60 4"Øx525μm n- Si:As[111] 0.001-0.005 P/E 78 n- Si:P 25 ±10% ITME aro 2 wks N/N+

E4_94 5 60.80 4"Øx525μm n- Si:As[111] 0.001-0.005 P/E 80 n- Si:P 17.5 ±10% ITME aro 2 wks N/N+

E4_51 4 75.60 4"Øx525μm n- Si:As[100] 0.001-0.005 P/E 90 n- Si:P 25.5 ±10% ITME aro 2 wks N/N+

E4_99 9 43.60 4"Øx525μm n- Si:Sb[111] 0.005-0.020 P/E 10 n- Si:P 1.5±10% ITME aro 2 wks N/N+

E4_9 5 50.00 4"Øx525μm n- Si:Sb[111] 0.005-0.020 P/E 14 n- Si:P 4.25 ±10% ITME aro 2 wks N/N+

E4_55 4 57.60 4"Øx525μm n- Si:Sb[111] 0.005-0.020 P/E 15 n- Si:P 90 ±10% ITME aro 2 wks N/N+

E4_27 10 40.00 4"Øx525μm n- Si:Sb[111] 0.005-0.020 P/E 18 n- Si:P 0.25 ±10% ITME aro 2 wks N/N+

E4_98 5 56.00 4"Øx400μm n- Si:Sb[111] 0.006-0.020 P/E 20 n- Si:P 300±10% ITME aro 2 wks N/N+

E4_58 3 67.20 4"Øx400μm n- Si:Sb[111] 0.005-0.020 P/E 20 n- Si:P 101 ±10% ITME aro 2 wks N/N+

E4_57 8 46.40 4"Øx400μm n- Si:Sb[111] 0.005-0.020 P/E 20 n- Si:P 136 ±10% ITME aro 2 wks N/N+

E4_56 16 40.00 4"Øx400μm n- Si:Sb[111] 0.005-0.020 P/E 20 n- Si:P 75 ±10% ITME aro 2 wks N/N+

E4_47 7 52.80 4"Øx400μm n- Si:Sb[111] 0.005-0.020 P/E 21 n- Si:P 700 ±10% ITME aro 2 wks N/N+

E4_97 9 47.20 4"Øx400μm n- Si:Sb[111] 0.006-0.020 P/E 21 n- Si:P 400±10% ITME aro 2 wks N/N+

E4_100 15 42.80 4"Øx525μm n- Si:Sb[111] 0.005-0.020 P/E 22.5 n- Si:P 12.5±10% ITME aro 2 wks N/N+

E4_14 2 82.40 4"Øx400μm n- Si:Sb[111] 0.005-0.020 P/E 25 n- Si:P 0.04 ±10% ITME aro 2 wks N/N+

E4_2 16 42.40 4"Øx400μm n- Si:Sb[111] 0.005-0.020 P/E 25 n- Si:P 0.08 ±10% ITME aro 2 wks N/N+

E4_37 13 55.60 4"Øx525μm n- Si:Sb[111] 0.005-0.020 P/E 36 n- Si:P >2500 ITME aro 2 wks N/N+

E4_66 5 56.00 4"Øx360μm n- Si:Sb[111] 0.005-0.020 P/E 37.5 n- Si:P 270 ±10% ITME aro 2 wks N/N+

E4_95 10 48.40 4"Øx400μm n- Si:Sb[111] 0.006-0.020 P/E 37.5 n- Si:P 85&plumn10% ITME aro 2 wks N/N+

E4_96 9 55.60 4"Øx525μm n- Si:Sb[111] 0.005-0.020 P/E 41 n- Si:P 2500±10% ITME aro 2 wks N/N+

E4_34 8 50.00 4"Øx350μm n- Si:Sb[100] 0.005-0.020 P/EOx 41 n- Si:P 3.6 ±10% ITME aro 2 wks N/N+

E4_73 14 52.20 4"Øx425μm n- Si:Sb[111] 0.008-0.018 P/E 50 n- Si:P 1100 ±10% ITME aro 2 wks N/N+

E4_60 9 52.80 4"Øx525μm n- Si:Sb[111] 0.005-0.020 P/E 60 n- Si:P 60 ±10% ITME aro 2 wks N/N+

E4_12 10 44.80 4"Øx525μm n- Si:Sb[111] 0.005-0.020 P/E 60 n- Si:P 58.75 ±10% ITME aro 2 wks N/N+

E4_19 6 51.60 4"Øx525μm n- Si:Sb[111] 0.005-0.020 P/E 70 n- Si:P 60 ±10% ITME aro 2 wks N/N+

E4_61 9 48.40 4"Øx525μm n- Si:Sb[111] 0.005-0.020 P/E 75 n- Si:P 125 ±10% ITME aro 2 wks N/N+

E4_43 4 73.20 4"Øx525μm n- Si:Sb[111] 0.005-0.020 P/E 100 n- Si:P 8000 ±10% ITME aro 2 wks N/N+

E4_44 8 57.20 4"Øx525μm n- Si:Sb[111] 0.005-0.020 P/E 100 n- Si:P 420 ±10% ITME aro 2 wks N/N+


3" EPI Wafers
Note: Surface - P = Polished, E = Etched, C = AsCut, Ox = Oxide (on that layer)
Add to
Cart		 Item Qty in Stock Price $/Qty Substrate EPI Source Comment
Size Type Res Ωcm Surf. Thick μm Type Res Ωcm

8611 100 26.40 3"Ø×381um n- Si:As[111-4º] 0.001-0.005 P/E 5.0-6.0 {5.2-5.7} n- Si:P 0.31-0.33 ITME N/N++

F667 120 12.00 3"Øx525μm n- Si:P[111] 0.001-0.005 P/E 4.5 n- Si:P (1.1-1.4) Motrla N/N+ Sealed cassettes of 24 wafers

E3_50 7 43.20 3"Øx381μm p- Si:B[111] 0.004-0.008 P/E 35.5 n- Si:P 4.5 ±10% ITME aro 2 wks N/P+

E3_52 14 40.80 3"Øx381μm p- Si:B[111] 0.004-0.008 P/E 70 n- Si:P 20 ±10% ITME aro 2 wks N/P+

E3_61 18 35.60 3"Øx508μm p- Si:B[100] 0.002-0.005 P/E 6.5/8 n- Si:P/p- Si:B 2.0/6.5 ITME aro 2 wks N/P/P+

E3_58 6 46.80 3"Øx381μm p- Si:B[100] 0.002-0.005 P/E 7.2/8.0 n- Si:P/p-Si:B 1.7/6.5 ITME aro 2 wks N/P/P+

E3_60 10 54.40 3"Øx508μm p- Si:B[111] 0.008-0.020 P/E 140/12.5 n- Si:P/p- Si:B 40/3 ITME aro 2 wks N/P/P+

E3_46 9 36.80 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 4.9 n- Si:P 0.85 ±10% ITME aro 2 wks N/N+

E3_32 18 30.80 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 5.5 n- Si:P 1.06 ±10% ITME aro 2 wks N/N+

E3_18 5 44.00 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 10 n- Si:P 4.15 ±10% ITME aro 2 wks N/N+

E3_40 5 44.00 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 11 n- Si:P 17.5 ±10% ITME aro 2 wks N/N+

E3_62 14 33.60 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 12 n- Si:P 1.8 ±10% ITME aro 2 wks N/N+

E3_55 12 34.00 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 12 n- Si:P 1.7 ±10% ITME aro 2 wks N/N+

E3_54 8 44.00 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 12 n- Si:P 2.1 ±10% ITME aro 2 wks N/N+

E3_2 9 35.20 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 12 n- Si:P 16 ±10% ITME aro 2 wks N/N+

E3_38 15 30.80 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 12 n- Si:P 1.3 ±10% ITME aro 2 wks N/N+

E3_24 18 29.60 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 12.5 n- Si:P 1.33 ±10% ITME aro 2 wks N/N+

E3_30 15 35.20 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 13 n- Si:P 1.3 ±10% ITME aro 2 wks N/N+

E3_22 12 33.60 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 15.5 n- Si:P 9 ±10% ITME aro 2 wks N/N+

E3_48 9 36.40 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 15.5 n- Si:P 9 ±10% ITME aro 2 wks N/N+

E3_42 4 49.20 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 18 n- Si:P 0.05 ±10% ITME aro 2 wks N/N+

E3_5 18 30.80 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 22 n- Si:P 4 ±10% ITME aro 2 wks N/N+

E3_27 5 45.20 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 22 n- Si:P 4 ±10% ITME aro 2 wks N/N+

E3_3 20 30.40 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 22 n- Si:P 4.8 ±10% ITME aro 2 wks N/N+

E3_57 18 32.00 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 22 n- Si:P 4.5 ±10% ITME aro 2 wks N/N+

E3_63 20 32.80 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 12 n- Si:P 16.5 ±10% ITME aro 2 wks N/N+

E3_25 9 37.60 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 28.5 n- Si:P 20 ±10% ITME aro 2 wks N/N+

E3_17 6 43.20 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 28.5 n- Si:P 4 ±10% ITME aro 2 wks N/N+

E3_53 8 42.00 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 30 n- Si:P 4 ±10% ITME aro 2 wks N/N+

E3_15 15 34.40 3"Øx355μm n- Si:As[111] 0.001-0.005 P/E 34 n- Si:P 9.5 ±10% ITME aro 2 wks N/N+

E3_51 8 39.20 3"Øx355μm n- Si:As[111] 0.001-0.005 P/E 34 n- Si:P 11 ±10% ITME aro 2 wks N/N+

E3_16 15 34.40 3"Øx355μm n- Si:As[111] 0.001-0.005 P/E 34 n- Si:P 12 ±10% ITME aro 2 wks N/N+

E3_4 9 41.20 3"Øx355μm n- Si:As[111] 0.001-0.005 P/E 36 n- Si:P 4 ±10% ITME aro 2 wks N/N+

E3_23 9 38.80 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 37.5 n- Si:P 0.6 ±10% ITME aro 2 wks N/N+

E3_1 20 32.80 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 41 n- Si:P 25 ±10% ITME aro 2 wks N/N+

E3_41 9 44.40 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 42 n- Si:P 20.5 ±10% ITME aro 2 wks N/N+

E3_19 18 32.00 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 42.5 n- Si:P 17 ±10% ITME aro 2 wks N/N+

E3_14 8 42.80 3"Øx355μm n- Si:As[111] 0.001-0.005 P/E 52.5 n- Si:P 12.5 ±10% ITME aro 2 wks N/N+

E3_56 19 36.80 3"Øx381μm n- Si:As[111] 0.001-0.005 P/E 56 n- Si:P 12 ±10% ITME aro 2 wks N/N+

E3_45 8 45.20 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 70 n- Si:P (65.7-80.3) ITME aro 2 wks N/N+

E3_33 10 42.40 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 72 n- Si:P 12.5 ±10% ITME aro 2 wks N/N+

E3_7 19 38.00 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 73 n- Si:P 84 ±10% ITME aro 2 wks N/N+

E3_44 8 45.20 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 75 n- Si:P 13 ±10% ITME aro 2 wks N/N+

E3_49 18 38.00 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 75 n- Si:P 11 ±10% ITME aro 2 wks N/N+

E3_12 8 46.40 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 80 n- Si:P 12 ±10% ITME aro 2 wks N/N+

E3_10 15 40.40 3"Øx375μm n- Si:As[111] 0.001-0.005 P/E 85 n- Si:P 22.5 ±10% ITME aro 2 wks N/N+

E3_34 10 43.60 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 85 n- Si:P 19.5 ±10% ITME aro 2 wks N/N+

E3_20 20 40.40 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 85 n- Si:P 66 ±10% ITME aro 2 wks N/N+

E3_43 18 44.00 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 96 n- Si:P 30 ±10% ITME aro 2 wks N/N+

E3_13 2 98.40 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 100 n- Si:P 12 ±10% ITME aro 2 wks N/N+

E3_8 5 58.40 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 100 n- Si:P 21 ±10% ITME aro 2 wks N/N+

E3_11 19 44.00 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 100 n- Si:P 16 ±10% ITME aro 2 wks N/N+

E3_21 10 48.40 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 100 n- Si:P 20 ±10% ITME aro 2 wks N/N+

E3_37 14 51.60 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 135 n- Si:P 35 ±10% ITME aro 2 wks N/N+

E3_39 4 69.60 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 140 n- Si:P 31 ±10% ITME aro 2 wks N/N+

E3_29 10 43.60 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 145 n- Si:P 38 ±10% ITME aro 2 wks N/N+

E3_26 18 39.20 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 145 n- Si:P 25 ±10% ITME aro 2 wks N/N+

E3_9 3 78.00 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 150 n- Si:P 44 ±10% ITME aro 2 wks N/N+

E3_28 15 40.40 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 158 n- Si:P 67 ±10% ITME aro 2 wks N/N+

E3_59 18 44.00 3"Øx508μm n- Si:As[111] 0.001-0.005 P/E 90/18 n- Si:P/n- Si:P 41/5 ITME aro 2 wks N/N/N+

E3_31 10 34.00 3"Øx381μm n- Si:Sb[111] 0.005-0.020 P/E 8 n- Si:P 0.63 ±10% ITME aro 2 wks N/N+

E3_35 15 32.00 3"Øx381μm n- Si:Sb[111] 0.005-0.020 P/E 22.5 n- Si:P 0.08 ±10% ITME aro 2 wks N/N+

E3_6 12 36.40 3"Øx381μm n- Si:Sb[111] 0.005-0.020 P/E 30 n- Si:P 6.75 ±10% ITME aro 2 wks N/N+

E3_64 10 48.40 3"Øx330μm n- Si:Sb[111] 0.005-0.018 P/E 75/25 n- Si:P/n- Si:P 40/2.5 ITME aro 2 wks N/N/N+
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