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Updated Thu 29 July 2010
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3-5 Semiconductors

GaAs , GaP , GaSb , InAs , InP , InSb

GaAs - Gallium Arsenide
Note: Surface - P = Polished, E = Etched, C = AsCut, Ox = Oxide (on that layer)
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Material Orient. Diam
(mm)
Thck
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Surf. Source Resistivity
Ωcm
Nc
a/cm3
Mobil
cm2/Vs
EPD
/cm2
Comment

B349 6 320.00 undoped SI GaAs:- [100-2.0° towards[110]] ±0.5° 6" 675 P/P Episto n-type >1E7   >5,000 <1E5 Epi Ready, SEMI (010) Notch

C284 9 240.00 undoped SI GaAs:- [100] 4" 625 P/P Episto n-type >1E7   >5,000 <8E4 EJ Flats; Epi Ready

9575 2 200.00 undoped SI GaAs:- [100] 3" 500 P/E Episto n-type >1E7   >4,000 <8E4 EJ Flats; Epi Ready

1014 6 190.00 undoped SI GaAs:- [100] 3" 400 P/E Comsec due 8/30 n-type   >4,000 <2E5 US Flats; Epi Ready

G014 6 200.00 undoped SI GaAs:- [100] 3" 380 P/P Comsec due 8/30 n-type   >4,000 <2E5 US Flats; Epi Ready

9680 24 160.00 undoped SI GaAs:- [100] 2" 380 P/E Girmet n-type (1.5-8.3)E7   5,000-7,130 <2,000 VGF; US Flats; Epi Ready

F680 22 165.00 undoped SI GaAs:- [100] 2" 350 P/P Girmet n-type (1.5-8.3)E7   5,000-7,130 <2,000 VGF; US Flats; Epi Ready

C149 1 40.00 undoped SI GaAs:- [100] 2" 350 BROKEN   n-type   >4,000 <5E4 VGF; US Flats

C764 1 140.00 undoped SI GaAs:- [100-4.0° towards[111]] ±0.5° 2" 400 P/E Comsec n-type 3E8 4.6E6 4,470 <8E4 US Flats; Epi Ready

I610 5 120.00 undoped SI GaAs:- [100] 2" 380 P/P Comsec n-type 9.1E7 1.37E7 5,000 <5E4 US Flats; Epi Ready, TTV<10µm, Bow/Warp<20µm

D149 36 90.00 undoped SI GaAs:- [100] 2" 380 P/E Comsec n-type 6.7E7 1.9E7 4,920 <8,600 VGF; US Flats; Epi Ready

B149 11 90.00 undoped SI GaAs:- [100] 2" 380 P/E Comsec n-type 5.2E7 2.3E7 5,600 <6.8E4 VGF; US Flats; Epi Ready

1149 24 100.00 undoped SI GaAs:- [100] 2" 350 P/P Comsec n-type 5.2E7 2.3E7 5,600 <6.8E4 VGF; US Flats; Epi Ready

9707 4 140.00 undoped GaAs:- [100] 2" 400 P/E ITME n-type 0.51 2.5E15 4,900 <6.8E4 US Flats; Epi Ready

E706 3 200.00 undoped SI GaAs:- [110] 2" 450 P/E ITME n-type 5.7E7 2.1E7 5,180 <3.2E4 Epi Ready; Primary Flat @ [1,-1,0], S Flat @ [001]

B543 25 128.00 undoped SI GaAs:- [111B] ±0.5° 2" 400 P/P Comsec n-type 7.5E7 1.7E7 5,010 <8E4 EJ Flats; Epi Ready

9874 2 120.00 undoped SI GaAs:- [111] 2" 500 P/E ITME n-type 3.6E7 4E7 5,200 <6.5E4 US Flats; Epi Ready

a08b 1 75.00 SI GaAs:x Poly. 10mm 2mm   Moscow #29 ~3E8       sample; 15g @ $5.00/g

9459 34 180.00 n-type GaAs:Si [100] 3" 600 P/P Episto 0.001-0.008   1,700-2,000 <500 VGF; EJ Flats; Epi Ready

D257 5 95.00 n-type GaAs:Si [100] 2" 400 C/C Comsec 0.0062 3.3E17 3,060 <4.8E4 US Flats; Epi Ready

9027 17 140.00 n-type GaAs:Si [100] 2" 350 P/E Episto   (1-3)E18 >2,000 <1,000 VGF; Epi Ready, EJ Flats(2)

D026 21 180.00 n-type GaAs:Si [100] ±0.1° 2" 450 ±15 P/E Girmet   (1.5-2.8)E18 2,100 <300 VGF; US Flats(2); Epi Ready

9706 4 150.00 n-type GaAs:Si [111] 2" 350 P/P ITME 0.02 9E16 3,440 <3.8E4 Epi Ready

9555 1 175.00 n-type GaAs:Te [100] 3" 500 P/P Comsec 0.021 6.9E16 4,295 <4.2E4 US Flats; Epi Ready

1013 26 80.00 n-type GaAs:Te [100] 2" 350 P/E Comsec 0.0041 4.1E17 3,660 <4.6E4 US Flats; Epi Ready

C013 5 80.00 n-type GaAs:Te [100] 2" 350 P/E Comsec 0.0026 8.2E17 2,900 <3.2E4 US Flats; Epi Ready

9723 1 150.00 n-type GaAs:Te [110] 2" 450 P/E Comsec 1.7E-3 1.2E18 3,050 <5.8E4 US Flats; Epi Ready; Primary Flat @ [001], S Flat @ [1,-1,0]

9567 1 145.00 n-type GaAs:Te [111] 2" 385 P/P Comsec 0.00275 1.1E18 2,070 <2.4E4 EJ Flats; Epi Ready

9995 3 200.00 p-type GaAs:Zn [100] 3" 500 P/P Comsec 0.105 3.04E17 218 <9.5E4 US Flats; Epi Ready

D057 2 30.00 p-type GaAs:Zn [100] 3" 350 BROKEN ITME 0.56 6.6E17 168 <5E4 BROKEN

9793 11 145.00 p-type GaAs:Zn [100] 2" 350 P/E ITME 4.5 3E16 60 <3.3E4 US Flats; Epi Ready

1126 1 155.00 p-type GaAs:Zn [100] 2" 350 P/E ITME 0.11 2.8E17 200 <3.8E4 US Flats; Epi Ready

C826 1 165.00 p-type GaAs:Zn [100] 2" 375 P/E ITME 0.0596 5.89E17 181 <5E4 US Flats; Epi Ready

9156 4 100.00 p-type GaAs:Zn [100] 1.22" 625 P/E ITME 0.0189 2.75E18 120 <3.6E4 US Flats; Epi Ready

9693 2 240.00 p-type GaAs:Zn [110] 3" 550 P/P ITME 0.105 2.7E17 217 <8E4 Epi Ready; Primary Flat @ [1,-1,0], S Flat @ [001]

B126 1 195.00 p-type GaAs:Zn [110] 3" 550 P/P ITME 0.101 2.7E17 217 <8E4 US Flats; Epi Ready

C015 12 180.00 p-type GaAs:Zn [110] 2" 400 P/E Comsec 0.19 1.35E17 235 <5E4 1 Flat; Epi Ready

2276 11 123.20 undoped SI GaAs:- [100] 2" 400 P/E ITME aro 2 wks n-type 9.6E7 1.2E7 5,100 <6.6E4 US Flats; Epi Ready

2130 5 180.80 undoped SI GaAs:- [100-1° towards[111A]] 2" 375 P/P ITME aro 2 wks n-type 8.7E7 1.3E7 5,380 <7.8E4 US Flats; Epi Ready

2061 1 210.00 undoped SI GaAs:- [100] 2" 1,800 P/E ITME aro 2 wks n-type 1.15E8 1.47E7 3,690 <4.39E4 US Flats; Epi Ready

2235B 3 139.00 undoped SI GaAs:- [100-6° towards[111A]] 2" 400 P/E ITME aro 2 wks n-type 2.5E7 4.8E7 5,000 <5E4 one wafer has a small scratch, and has polishing fault on edge

2235 1 163.00 undoped SI GaAs:- [100-6° towards[111A]] 2" 400 P/E ITME aro 2 wks n-type 2.5E7 4.8E7 5,000 <5E4 Epi Ready

1684 35 140.00 undoped SI GaAs:- [100] 2" 400 P/E ITME aro 2 wks n-type 0.51 2.51E15 4,900 <6.8E4 US Flats; Epi Ready

2174 10 140.00 undoped SI GaAs:- [100] 2" 380 P/E ITME aro 2 wks n-type 0.87 3.7E15 1,940 <5.8E4 US Flats; Epi Ready

2313 1 280.00 undoped SI GaAs:- [110] 2" 500 P/P ITME aro 2 wks n-type 4.3E7 2.86E7 5,080 <10,000 Epi Ready; PF(110), SF(100), SEMI

2277 1 151.00 undoped SI GaAs:- [111A-5° towards[100]] 2" 400 P/E ITME aro 2 wks n-type 2.8E7 3.4E7 6,500 <8E4 US Flats; Epi Ready

2283C 2 136.60 undoped SI GaAs:- [111] 2" 400 P/E ITME aro 2 wks n-type 3.6E7 4E7 5,200 <6.5E4 one shallow scratch near wafer center

P411 4 460.00 undoped SI GaAs:- [411] 2" 400 P/E Comsec aro 2 wks n-type 1.13E8 1.48E7 3,730 <7.5E4 US Flats; Epi Ready

2002A 1 145.00 n-type GaAs:Si [100] 2" 400 P/E ITME aro 2 wks 0.158 2.6E16 3,477 <4.7E4 US Flats; Epi Ready

2002B 6 127.00 n-type GaAs:Si [100] 2" 400 P/P ITME aro 2 wks 0.158 2.6E16 3,477 <4.7E4 US Flats; Epi Ready

1914 4 121.00 n-type GaAs:Si [100] 2" 400 P/E ITME aro 2 wk 0.019 8.8E16 3,730 <5E4 US Flats; Epi Ready

2218 1 145.00 n-type GaAs:Si [100-1° towards[110]] 2" 450 P/E ITME aro 2 wks 7.0E-3 3.2E17 2,740 <4.6E4 US Flats, Epi Ready

2094 1 160.00 n-type GaAs:Te [100] 2" 1,500 P/E ITME aro 2 wks 0.0106 1.85E17 3,200 <4.3E4 Epi Ready

1721 4 140.00 n-type GaAs:Te [100-4° towards[111]] 2" 400 P/E ITME aro 2 wks 4.1E-3 4.7E17 3,220 <5.6E4 Epi Ready

2153A 3 140.00 n-type GaAs:Te [100] 2" 400 P/E ITME aro 2 wks 4.86E-3 5.27E17 3,000 <4.6E4 US Flats; Epi Ready

1402 1 140.00 n-type GaAs:Te [100] 2" 375 P/E ITME aro 2 wks 2.68E-3 8.9E17 2,553 <5E4 US Flats; Epi Ready

2054 1 140.00 n-type GaAs:Te [100] 2" 375 P/E ITME aro 2 wks 2.40E-3 1.04E18 2,950 <1E5 US Flats; Epi Ready

1705 1 145.00 n-type GaAs:Te [100] 2" 650 P/P ITME aro 2 wks 1.65E-3 1.6E18 2,375 <10,000 US Flats; Epi Ready

2145 3 140.00 n-type GaAs:Te [100] 2" 400 P/E ITME aro 2 wks 1.74E-3 1.97E18 2,144 <1E5 US Flats; Epi Ready

2123 1 180.00 n-type GaAs:Te [110] 2" 1,000 P/E ITME aro 2 wks 1.5E-3 1.6E18 2,450 <2.5E4 Epi Ready

2161B 1 140.00 n-type GaAs:Te [111B] 2" 400 P/E ITME aro 2 wks 1.1E-3 2.58E18 2,430 <5E4 etched back-side

2161A 2 140.00 n-type GaAs:Te [111] 2" 400 P/E ITME aro 2 wks 1.1E-3 2.58E18 2,430 <5.9E4 semi-etched back-side

2161C 8 145.00 n-type GaAs:Te [111B] 2" 385 P/P ITME aro 2 wks 9.3E-4 2.8E18 2,400 <5E4 Epi Ready

2161D 5 140.00 n-type GaAs:Te [111] 2" 400 P/E ITME aro 2 wks 1.1E-3 2.8E18 2,400 <5.9E4 Epi Ready

2201B 1 165.00 p-type GaAs:Zn [100] 2" 270 P/E ITME aro 2 wks 0.11 2.8E17 200 <3.8E4 US Flats; Epi Ready

2170 6 125.00 p-type GaAs:Zn [100] 1.22" 625 P/E ITME aro 2 wks 1.89E-2 2.75E18 120 <3.6E4 US Flats; Epi Ready


GaP - Gallium Phosphide
Note: Surface - P = Polished, E = Etched, C = AsCut, Ox = Oxide (on that layer)
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Material Orient. Diam
(mm)
Thck
(μm)
Surf. Source Resistivity
Ωcm
Nc
a/cm3
Mobil
cm2/Vs
EPD
/cm2
Comment

9510 12 360.00 undoped GaP:- [100] 3" 300 P/P Comsec n-type 69 6.2E14 145 <2.3E5 US Flats; Epi Ready

9915 1 360.00 SI GaP:Cr [100] 2" 400 P/P ITME n-type 2.4E13 6.5E3 40 <5E4 US Flats; Epi Ready

B915 6 360.00 SI GaP:Cr [100] 2" 400 P/P Comsec n-type 2.4E13 6.5E3 40 <5E4 US Flats; Epi Ready

9431 1 6580.00 undoped GaP:- ingot [100] 3" 25,700   Girmet n-type <1E16 {<1E15}   <1E5 US Flats; 0.482kg

1048 2 240.00 undoped GaP:- [100] 2" 300 P/P Comsec n-type <5E15 >140 <6E4 Epi Ready Diced into at least 10 of 10×10mm squares

8911 2 450.00 undoped GaP:- [100] 2" 1,850 P/P Comsec n-type 1.7 2.2E15 163 <5.5E4 US Flats; Epi Ready

1047 5 250.00 undoped GaP:- [100] 2" 300 P/P Comsec n-type 12.6 3.3E15 150 <4E4 US Flats; Epi Ready

E595 1 240.00 undoped GaP:- [100] 2" 300 P/P Comsec n-type 8.7 4.5E15 160 <5.1E4 US Flats; Epi Ready

B333 4 220.00 undoped GaP:- [100] 2" 300 P/P Comsec n-type 1.3 3E16 160 <5.8E4 US Flats; Epi Ready

B206 1 260.00 undoped GaP:- [100-5° towards[110]] 2" 400 P/E ITME n-type 1.3 4E16 120 <2E4 1 US Flat; Epi Ready

C206 1 280.00 undoped GaP:- [100-10° towards[110]] 2" 400 P/E ITME n-type 1.3 4E16 120 <2E4 US Flats; Epi Ready

E194 1 120.00 undoped GaP:- [100] 2" 300 P/P Comsec n-type 9 5E16 150 <1E5 US Flats; Epi Ready; With Dimples but within 8<µm limit

B802 1 290.00 undoped GaP:- [100] 2" 1,000 P/P Comsec n-type 0.73 5.2E16 160 <2E4 US Flats; IR T Spectrum available

1185 1 295.00 undoped GaP:- [110] 2" 960 L/L ITME due 8/09 n-type 1.8E8 2.3E8 160 <5E4 Epi Ready; PF-.(001)-16mm; SF->(111)A -8mm

H921 4 360.00 undoped GaP:- [111A] ±0.5° 3" 550 P/E Comsec n-type 5.3 8.1E15 145 <6E4 US Flats; Epi Ready

G921 6 360.00 undoped GaP:- [111A] ±0.5° 3" 550 P/E Comsec n-type 5.3 8.1E15 145 <6E4 US Flats; Epi Ready

F921 3 360.00 undoped GaP:- [111A] ±0.5° 3" 550 P/E Comsec n-type 5.3 8.1E15 145 <6E4 US Flats; Epi Ready

J921 3 360.00 undoped GaP:- [111A] ±0.5° 3" 550 P/E Comsec n-type 0.48 1E17 129 <5.5E4 US Flats; Epi Ready

9998 2 280.00 SI undoped GaP:- [111] 2" 450 P/E ITME n-type 3.5E10 1.4E6 125 <5E4 Epi Ready; PF@(110), SF@(112)

9222 7 250.00 undoped GaP:- [111] ±0.5° 2" 400 P/P Comsec n-type 6.5 6.9E15 140 <3.4E4 US Flats; Epi Ready

B926 1 240.00 undoped GaP:- [111] 2" 400 P/P ITME n-type 1.53 2.7E16 150 <3.4E4 EJ Flats; Epi Ready

E942 6 240.00 n-type GaP:S [100] 2" 350 P/P Comsec   (1-9)E17   <1E5 US Flats; Epi Ready

H712 2 250.00 n-type GaP:S [100-4° towards[001]] ±0.5° 2" 400 P/E Comsec 0.36 1.6E17 110 <2E5 US Flats; Epi Ready

9594 8 240.00 n-type GaP:S [100] 2" 400 P/P Comsec 0.155 4E17 100 <8E4 US Flats; Epi Ready

9775 2 398.00 n-type GaP:S [100-6° towards[[111]A]] 2" 400 P/E Comsec 0.058 9.9E17 107 <5.3E4 US Flats; Epi Ready

1139 3 180.00 n-type GaP:S [100] 2" 500 P/E ITME 0.059 1.08E18 100 <4.5E4 EJ Flats; Crystal fault 3-8mm long at wafer edge

D126 1 325.20 p-type GaP:Zn [100-2° towards[111A]] 2" 400 P/E ITME 0.2 4E17 80 <9.2E4 US Flats; Epi Ready

1153 4 250.00 p-type GaP:Zn [100] 2" 400 P/E ITME 0.081 1.1E18 70 <2E5 EJ Flats; Epi Ready

1080 3 255.00 p-type GaP:Zn [111B] 2" 500 P/E ITME 0.11 8.8E17 64 <8E4 EJ Flats; Epi Ready

F126 1 255.00 p-type GaP:Zn [111B] 2" 500 P/E ITME 0.11 8.8E17 64 <8E4 EJ Flats; Epi Ready

G126 1 255.00 p-type GaP:Zn [111] 2" 450 P/E ITME 0.075 1.28E18 63 <8E4 EJ Flats; Epi Ready

G31 5 296.00 SI GaP:Cr [100] 2" 400 P/P Comsec aro 3 wks n-type >1E6     <1E5 US Flats; Epi Ready

G31b 10 448.00 SI undoped GaP:- [100] 3" 500 P/P Comsec aro 3 wks n-type >1E6 {>7E8}     <1E5 US Flats; Epi Ready

B853 2 850.00 SI undoped GaP:- [100] 3" 1,000 P/P Comsec aro 1 wks n-type 7.3E8 6E7 142 <4.1E4 US Flats; Epi Ready

117 4 349.20 undoped GaP:- [100] 2" 300 P/P ITME aro 2 wks n-type 12.6 3.3E15 150 <4E4 US Flats; Epi Ready

103A 1 250.00 undoped GaP:- [100] 2" 300 P/P ITME aro 2 wks n-type 9 4.5E15 155 <5.8E4 micro-scratch

103B 1 277.00 undoped GaP:- [100] 2" 300 P/P ITME aro 2 wks n-type 9 4.5E15 155 <5.8E4 US Flats; Epi Ready

M-94 4 289.20 undoped GaP:- [100] 2" 400 P/P ITME aro 3 wks n-type 2.51 2.11E16 118 <5E4 SEMI; Test

103C 2 480.00 undoped GaP:- [100] 2" 2,000 P/P ITME aro 2 wks n-type 1.6 2.5E16 150 <5.8E4 reclaimed wafer

117A 4 313.20 undoped GaP:- [100-2° towards[110]] 2" 500 P/E ITME aro 2 wks n-type 1.04 3.9E16 168 <5E4 (100) ->2°-><110> EJ

M087C 1 260.00 undoped GaP:- [100-2° towards[110]] 2" 400 P/E ITME aro 2 wks n-type 1.3 4E16 120 <2E4 Small gauges on the edge

M087A 2 277.00 undoped GaP:- [100-5° towards[110]] 2" 400 P/E ITME aro 2 wks n-type 1.3 4E16 120 <2E4 Epi Ready

M087B 3 301.00 undoped GaP:- [100-10° towards[110]] 2" 400 P/E ITME aro 2 wks n-type 1.3 4E16 120 <2E4 Epi Ready

186A 15 265.00 undoped GaP:- [111] 2" 450 P/E ITME aro 2 wks n-type 60.9 6E14 169 <4.5E4 Epi Ready; PF@(110),SF@(112)

144 12 255.00 undoped GaP:- [111B] 2" 400 P/E ITME aro 2 wks n-type 4.6 1E16 135 <8.8E4 Epi Ready; PF@(110), SF@(112)

149 1 376.00 undoped GaP:- [111B] 2" 400 P/E ITME aro 2 wks n-type 3.2 2E16 170 <5E4 EJ Flats; Epi Ready

88A 1 265.00 n-type GaP:S [100] 2" 400 P/E ITME aro 2 wks 0.24 2.3E17 110 <7.1E4 US Flats; Epi Ready

86B 7 250.00 n-type GaP:S [100] 2" 400 P/E ITME aro 2 wks 0.131 4.3E17 110 <1.2E5 Epi Ready

108 2 253.00 n-type GaP:S [100-2° towards[110]] 2" 350 ±10 P/E ITME aro 2 wks 0.042 1.8E18 82 <5.9E4 EJ Flats; Epi Ready

113 4 255.00 n-type GaP:S [100-2°] 2" 350 ±10 P/E ITME aro 2 wks 0.034 2E18 90 <6.7E4 reclaimed wafer

M008A 1 319.00 n-type GaP:S [111] 2" 1,000 P/P ITME aro 2 wks 0.209 2.21E17 135 <5E4 Epi Ready

M009 7 265.00 n-type GaP:S [111] 2" 275 P/E ITME aro 2 wks 0.136 4.37E17 105 <5E4 1 wafer has small loss on edge

187A 6 250.00 p-type GaP:Zn [100] 2" 350 P/E ITME aro 2 wks 0.41 2.05E17 74 <4.5E4 EJ Flats; Epi Ready

187 2 325.20 p-type GaP:Zn [100-2° towards[111A]] 2" 400 P/E ITME aro 2 wks 0.2 4E17 80 <9.2E4 US Flats; Epi Ready

187B 11 250.00 p-type GaP:Zn [100] 2" 400 P/E ITME aro 2 wks 0.117 6.95E17 77 <4.5E4 US Flats; Epi Ready

90 4 250.00 p-type GaP:Zn [100] 2" 400 P/E ITME aro 2 wks 0.081 1.1E18 70 <2E5 EJ Flats; Epi Ready

177 10 250.00 p-type GaP:Zn [100] 2" 350 P/E ITME aro 2 wks 0.0776 1.39E18 57 <5E4 EJ Flats; Epi Ready

177B 7 265.00 p-type GaP:Zn [100] 2" 270 P/P ITME aro 2 wks 0.0776 1.39E18 57 <5E4 EJ Flats; Epi Ready

169B 2 255.00 p-type GaP:Zn [111B] 2" 500 P/E ITME aro 2 wks 0.11 8.8E17 64 <8E4 EJ Flats; Epi Ready

169A 5 255.00 p-type GaP:Zn [111] 2" 450 P/E ITME aro 2 wks 0.075 1.28E18 63 <8E4 EJ Flats; Epi Ready


GaSb - Gallium Antimonide
Note: Surface - P = Polished, E = Etched, C = AsCut, Ox = Oxide (on that layer)
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Material Orient. Diam
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Surf. Source Resistivity
Ωcm
Nc
a/cm3
Mobil
cm2/Vs
EPD
/cm2
Comment

9761 3 320.00 n-type GaSb:Te [100-6° towards[111]] ±0.5° 2" 400 P/E ITME 0.0019-0.0048 (4.4-13)E17 2,540-2,950 <10,000 US Flats; Epi Ready

D924 3 340.00 undoped GaSb:- [100] 2" 350 P/E Comsec p-type 0.123 1.83E16 2,770 <4E4 US Flats; Epi Ready

E924 8 360.00 undoped GaSb:- [100] 2" 450 P/P Comsec p-type 0.123 1.83E16 2,770 <4E4 US Flats; Epi Ready

GaSb17 95 298.00 n-type GaSb:Te [100] 2" 450 P/E ITME aro 5 wks 0.0009-0.0034 (0.2-1.5)E18 @ 77°K 4,500-9,000 @ 77°K <10,000 US Flats; Epi Ready

18 2 308.00 n-type GaSb:Te [100-6° towards[111]] 2" 400 P/E ITME aro 2 wks 1.9E-3-4.8E-3 (4.4-13)E17 2,540-2,950 <10,000 US Flats; Epi Ready

GaSb19 60 298.00 p-type GaSb:Si [100] 2" 450 P/E ITME aro 5 wks 0.025-0.030 (2.6-3.5)E17 @ 77°K 700-780 @ 77°K <10,000 US Flats; Epi Ready

GaSb22 85 298.00 p-type GaSb:Si [100] 2" 450 P/E ITME aro 5 wks 0.0060-0.0075 (1.6-4.5)E18 @ 77°K 200-400 @ 77°K <10,000 US Flats; Epi Ready

GaSb20 25 298.00 p-type GaSb:Si [100] 2" 450 P/E ITME aro 5 wks 0.0004-0.0015 (1.6-2.6)E19 @ 77°K 230-300 @ 77°K <10,000 US Flats; Epi Ready

GaSb24 80 298.00 p-type GaSb:Zn [100] 2" 450 P/E ITME aro 5 wks 0.0063-0.0076 (2.2-2.9)E18 @ 77°K 340-370 @ 77°K <10,000 US Flats; Epi Ready

GaSb26 30 298.00 p-type GaSb:Zn [100] 2" 450 P/E ITME aro 5 wks 0.0023-0.0025 (7.7-7.9)E18 @ 77°K 310-360 @ 77°K <10,000 US Flats; Epi Ready


InAs - Indium Arsenide
Note: Surface - P = Polished, E = Etched, C = AsCut, Ox = Oxide (on that layer)
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Surf. Source Resistivity
Ωcm
Nc
a/cm3
Mobil
cm2/Vs
EPD
/cm2
Comment

D771 2 280.00 n-type InAs:S [100] 2" 400 P/E Comsec 0.000740 5.7E17 14,770 <5,500 US Flats; Epi Ready

C847 1 280.00 n-type InAs:S [100] 2" 450 P/E Comsec 0.000740 5.7E17 14,770 <5,500 US Flats; Epi Ready

9703 1 290.00 p-type InAs:Zn [100] 2" 400 P/E ITME   7.2E18 110 <100 US Flats; Epi Ready

InAs98 50 290.00 undoped InAs:- [100] 2" 400 P/E ITME aro 5 wks n-type (2-3)E16 20,500-22,000 <5,000 Epi Ready, US Flats

InAs88 20 298.00 undoped InAs:- [100] 2" 400 P/E ITME aro 5 wks n-type (2-3)E16 21,000-23,000 <100 Epi Ready, US Flats

InAs96 55 298.00 n-type InAs:S [100] 2" 400 P/E ITME aro 5 wks   (6-9)E17 12,500-14,000   Epi Ready, US Flats

96 4 325.20 n-type InAs:S [100] 2" 400 P/E ITME aro 3 wks 6.4E-4 6.7E17 14,400 <1,500 Epi Ready


InP - Indium Phosphide
Note: Surface - P = Polished, E = Etched, C = AsCut, Ox = Oxide (on that layer)
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Comment

C674 5 520.00 SI InP:Fe [100] 3" 600 P/E ITME 2.2E7 1.38E8 2,050 <7.3E4 US Flats; Epi Ready

9977 5 270.00 SI InP:Fe [100] 2" 470 P/P Comsec 3.7E7   2,300 <2E4 US Flats; Epi Ready

8585 3 220.00 SI InP:Fe [100] 2" 350 P/E Comsec (1.85-8.85)E7 (3.6-17)E7 1,970-1,980 <5E4 (4.1-4.7)E4 US Flats; Epi Ready

D221 1 240.00 SI InP:Fe [100] 2" 400 P/P Comsec 5.48E7 5.07E7 2,245 <4.1E4 US Flats; Epi Ready

B134 3 220.00 SI InP:Fe [100] 2" 450 P/E Comsec 4.5E17 6.9E7 2,020 <5E4 US Flats; Epi Ready

9198 6 240.00 n-type InP:S [100] 2" 400 P/P Comsec (0.00060-0.00094) (5.1-8.5)E18 1,250-1,500 <6,200 US Flats; Epi Ready

9308 4 220.00 n-type InP:S [100] 2" 400 P/E Comsec 0.0007 7.1E18 1,250 <6,200 US Flats; Epi Ready

D086 4 240.00 n-type InP:S [100] 2" 400 P/P Comsec 6.5E-4 8.3E18 1,160 <1.1E4 US Flats; Epi Ready

9766 4 220.00 p-type InP:Zn [100] 2" 400 P/E Comsec 0.024 4.7E18 52 1,100 US Flats; Epi Ready

P050 10 243.00 InP:S+Zn [100] 2" 400 P/E Comsec aro 2 wks 2.03E-2 3.8E17 810 <4.2E4 US Flats; Epi Ready

700 12 320.40 SI InP:Fe [100] 50.7 350 P/E ITME aro 2 wks 2.9E7 1.1E8 2,000 <2.3E4 Epi Ready

P098 1 265.00 SI InP:Fe [100] 2" 350 P/E ITME aro 2 wks (3.6-17.0)E7 (1.85-8.85)E7 1,970-1,980 <4.7E4 US Flats; Epi Ready

491 1 265.00 SI InP:Fe [100] 2" 300 P/E ITME aro 2 wks 1.35E7 3.03E8 1,669 <5.4E4 US Flats; Epi Ready

P047 80 220.00 n-type InP:(S+Zn) [100] 50mm 400* P/E* Comsec aro 4 wks 0.028-0.072 (4.4-4.9)E18 46 <300 2Flts

P068 2 490.00 n-type InP:S [100] 3" 600 P/E ITME aro 2 wks 4.35E-4 1.48E19 985 <2,000 EJ Flats; Epi Ready

IP_1 18 180.00 n-type InP:S [100] 50 450* C/C* Comsec aro 2 wks US Flts (3.2-4.2)E18   <4E4  

511 1 265.00 n-type InP:S [100] 2" 500 P/E ITME aro 2 wks 1.2E-3 3.9E18 1,280 <2.1E4 Epi Ready

IP_2 24 120.00 n-type InP:S [100] 50 450* C/C* Comsec aro 2 wks US Flts (4.2-5.2)E18   <4E4  

P025 40 220.00 n-type InP:S [100] 2" 400* P/E* Comsec aro 4 wks 0.00094-0.00054 (4.3-9.5)E18   6,000 2Flts

IP_3 24 120.00 n-type InP:S [100] 50 450* C/C* Comsec aro 2 wks US Flts (5.2-8.1)E18   <3E4  

P037 5 250.00 n-type InP:S [100] 2" 400 P/E ITME aro 2 wks 7.72E-4 5.77E18 1,408 <10,000 US Flats; Epi Ready

P054B 2 255.00 n-type InP:S [100] 2" 350 P/E ITME aro 2 wks 8.4E-4 6.12E18 1,410 <5,000 US Flats; Epi Ready

P041 5 250.00 n-type InP:S [100] 2" 400 P/E ITME aro 2 wks 7.23E-4 6.8E18 1,330 <4,500 Epi Ready

P029 6 250.00 n-type InP:S [100] 2" 400 P/E ITME aro 2 wks 5.7E-4 8.24E18 1,330 <10,000 US Flats; Epi Ready

IP_4 4 132.00 n-type InP:S [100] 50 450* C/C* Comsec aro 2 wks US Flts 8.5E18   <1E4  

474A 3 255.00 n-type InP:S [100] 2" 400 P/E ITME aro 2 wks 8.08E-4 9.18E18 1,110 <5E4 US Flats; Epi Ready

474B 2 255.00 n-type InP:S [100] 2" 400 P/E ITME aro 2 wks 7.08E-4 9.3E18 950 <1,000 EJ Flats; Epi Ready

474 4 253.00 n-type InP:S [100] 2" 400 P/E ITME aro 3 wks 7.08E-4 9.3E18 950 <1,000 SEMI

636 4 295.00 n-type InP:S [115] 2" 400 P/E ITME aro 2 wks 1.08E-3 4.07E18 1,416 <3.7E4 Epi Ready


InSb - Indium Antimonide
Note: Surface - P = Polished, E = Etched, C = AsCut, Ox = Oxide (on that layer)
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Nc
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Mobil
cm2/Vs
EPD
/cm2
Comment

F860 3 348.00 n-type InSb:Te [111A] ±0.5° 2" 450 P/E Comsec 0.00011-0.00033 (5.7-20)E17 24,000-34,000 <1,300 US Flats; Epi Ready

G860 4 348.00 n-type InSb:Te [111B] ±0.5° 2" 450 P/E Comsec 0.00011-0.00033 (5.7-20)E17 24,000-34,000 <1,300 EJ Flats; Epi Ready
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